Atom Lithography

Name: Atom Lithography
Brand: LAP Lambert Academic Publishing
SKU: 9783843371964
Price: 967 CZK
Availability: InStock

From Newtonian to Path integral approach

Autor: Monsit Tanasittikosol

Jazyk:

Vazba: Brožovaná

Vydavatel: LAP Lambert Academic Publishing

Dostupnost: Skladem u dodavatele

Odesíláme za 8-11 dnů

967 Kč

This book discusses two approaches used as the tools to study atom lithography. The book begins with...

Informace o knize

Autor

Monsit Tanasittikosol

Jazyk

Angličtina

Vazba

Kniha - Brožovaná

Vydáno

2010

Stránek

EAN

9783843371964

Enbook ID

07116200

Vydavatel

LAP Lambert Academic Publishing

Hmotnost

130

Rozměry

150 x 220 x 5

Kompletní popis

This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated.

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Atom Lithography

From Newtonian to Path integral approach

Informace o knize

Kompletní popis

Mohlo by vás zajímat

Zákaznicí kteří koupili tuto knihu koupili také