Atomic Layer Deposition

Name: Atomic Layer Deposition
Brand: John Wiley & Sons Inc
SKU: 9781118062777
Price: 4825 CZK
Availability: InStock

Principles, Characteristics, and Nanotechnology Applications

Autor: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman

Jazyk:

Vazba: Pevná

Vydavatel: John Wiley & Sons Inc

Dostupnost: Skladem u dodavatele

Odesíláme za 9-15 dnů

4 825 Kč

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf...

Informace o knize

Autor

Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman

Jazyk

Angličtina

Vazba

Kniha - Pevná

Vydáno

2013

Stránek

272

EAN

9781118062777

ISBN

1118062779

Enbook ID

04949772

Vydavatel

John Wiley & Sons Inc

Hmotnost

582

Rozměry

240 x 164 x 25

Kompletní popis

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

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Kompletní popis

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