High Dielectric Constant Materials

Name: High Dielectric Constant Materials
Brand: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
SKU: 9783540210818
Price: 7591 CZK
Availability: InStock

VLSI MOSFET Applications

Autor: Howard Huff, David Gilmer

Jazyk:

Vazba: Pevná

Vydavatel: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG

Dostupnost: Skladem u dodavatele v malém množství

Odesíláme za 13-18 dnů

7 591 Kč

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving Int...

Informace o knize

Autor

Howard Huff, David Gilmer

Jazyk

Angličtina

Vazba

Kniha - Pevná

Vydáno

2004

Stránek

710

EAN

9783540210818

ISBN

3540210814

Enbook ID

05273715

Vydavatel

Springer-Verlag Berlin and Heidelberg GmbH & Co. KG

Hmotnost

2650

Rozměry

155 x 235 x 45

Kompletní popis

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

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High Dielectric Constant Materials

VLSI MOSFET Applications

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Kompletní popis

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