Ion Implantation: Basics to Device Fabrication

Name: Ion Implantation: Basics to Device Fabrication
Brand: Springer
SKU: 9780792395201
Price: 5023 CZK
Availability: InStock

Autor: Emanuele Rimini

Jazyk:

Vazba: Pevná

Vydavatel: Springer

Dostupnost: Skladem u dodavatele

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Ion Implantation: Basics to Device Fabrication is a collection of research dealing with several aspe...

Informace o knize

Autor

Emanuele Rimini

Jazyk

Angličtina

Vazba

Kniha - Pevná

Vydáno

1994

Stránek

393

EAN

9780792395201

ISBN

0792395204

Enbook ID

01398291

Vydavatel

Springer

Hmotnost

1660

Rozměry

155 x 235 x 27

Kompletní popis

Ion Implantation: Basics to Device Fabrication is a collection of research dealing with several aspects of ion implantation, including basic information on the physics of devices, ion implanters, channeling implants, yield, damage and its annealing, in addition to a host of other topics. Particular attention has been paid to those techniques that provide two-dimensional profiles of damage and of dopants, a careful treatment of silicon based devices, threshold voltage control, shallow junctions, minority carrier lifetime control by metallic ion implants, and high energy implants is given in this work. This book, based on a course preceding the biannual Ion Implantation Technology Conference, is a valuable reference for physicists, chemists, materials scientists, processing, device production, device design, and ion beam engineers interested in any aspect of ion implantation, as well as a secondary text for a graduate course on the subject.

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