Kniha Layout Optimization in VLSI Design Bing Lu

Layout Optimization in VLSI Design

Jazyk: Angličtina
Vazba: Pevná
Vydavatel: Springer, Berlin
Dostupnost: Skladem u dodavatele
Odesíláme za 10-13 dnů
3 426
The exponential scaling of feature sizes in semiconductor technologies has side-effects on layout op...

Informace o knize

Jazyk
Angličtina
Vazba
Kniha - Pevná
Vydáno
2001
Stránek
288
EAN
9781402000898
ISBN
1402000898
Enbook ID
01414475
Vydavatel
Hmotnost
599
Rozměry
160 x 240 x 17

Kompletní popis

The exponential scaling of feature sizes in semiconductor technologies has side-effects on layout optimization, related to effects such as interconnect delay, noise, crosstalk, signal integrity, parasitics effects, and power dissipation, that invalidate the assumptions that form the basis of previous design methodologies and tools. This book is intended to sample the most important, contemporary, and advanced layout optimization problems emerging with the advent of very deep submicron technologies in semiconductor processing. Audience: A reference work for graduate students, senior undergraduates, and researchers.

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