Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Autor:
Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)
Dostupnost:
Skladem u dodavatele
Odesíláme za 9-15 dnů
5 621
Kč
This book describes the application of machine learning modelling approaches in atomic layer deposit...
