Kniha Semiconductor Wafer Cleaning Using Megasonics Keswani Manish

Semiconductor Wafer Cleaning Using Megasonics

Role of Electro-Acoustic and Cavitation Effects in Electrolyte Solutions

Jazyk: Angličtina
Vazba: Brožovaná
Dostupnost: Skladem u dodavatele
Odesíláme za 9-15 dnů
1 377
Megasonic cleaning is routinely used in the §semiconductor industry to remove particle §contaminants...

Informace o knize

Jazyk
Angličtina
Vazba
Kniha - Brožovaná
Vydáno
2008
Stránek
172
EAN
9783639090307
ISBN
3639090306
Enbook ID
06818136
Hmotnost
248
Rozměry
154 x 227 x 9

Kompletní popis

Megasonic cleaning is routinely used in the §semiconductor industry to remove particle §contaminants from wafer and mask surfaces. Cleaning §is achieved through proper choice of chemical §solutions, power density & frequency of acoustic §field. Considerable work has been done to increase §the understanding of particle removal mechanisms in §megasonic cleaning using different solution §chemistries with varying ionic strengths. However, §to date, the focus of all these studies of particle §removal has been either cavitation or acoustic §streaming. It is well known that the propagation of §sound through a colloidal dispersion containing ions§results in the generation of two types of §oscillating electric potentials, namely, Ionic §Vibration Potential & Colloid Vibration Potential. §This book reviews some of the current work that §shows that these potentials and their associated §electric fields can exert significant forces on §charged particles adhered to a surface, resulting in§their removal.

Mohlo by vás zajímat

1 688
855
1 109
813
1 618

Latin America

Feminist Review Collective
817

Refiguring Mimesis

Adrian Streete
1 215

China Business ABC

Kent Williamsson
426

Puro Teatro, A Latina Anthology

Nancy Saporta Sternbach
937

Lord of the Flies

William Golding
212

Zákaznicí kteří koupili tuto knihu koupili také

2 533

Drei Schwestern

Anton Pavlovich Chekhov
129