Silicon Nitride for Microelectronic Applications

Name: Silicon Nitride for Microelectronic Applications
Brand: Springer-Verlag New York Inc.
SKU: 9781468461640
Price: 2286 CZK
Availability: InStock

Part 1 Preparation and Properties

Autor: John T. Milek

Jazyk:

Vazba: Brožovaná

Vydavatel: Springer-Verlag New York Inc.

Dostupnost: Skladem u dodavatele

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2 286 Kč

The large amount of literature on the technology of thin film silicon nitride indi cates the interes...

Informace o knize

Autor

John T. Milek

Jazyk

Angličtina

Vazba

Kniha - Brožovaná

Vydáno

2013

Stránek

118

EAN

9781468461640

ISBN

1468461648

Enbook ID

02005958

Vydavatel

Springer-Verlag New York Inc.

Hmotnost

333

Rozměry

210 x 279 x 8

Kompletní popis

The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation 5 Introduction 5 Direct Nitridation Method 8 Evaporation Method 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.

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Silicon Nitride for Microelectronic Applications

Part 1 Preparation and Properties

Informace o knize

Kompletní popis

Mohlo by vás zajímat

Zákaznicí kteří koupili tuto knihu koupili také